Local Defectivity Control of 2D Self-Assembled Block Copolymer Patterns

Surface patterning of copolymers via self‐assembly is achieved by substrate design. The figure shows a polystyrene‐block‐poly(methyl methacrylate) symmetric diblock copolymer confined in a tapered structure. Engineering the channel structure provides local defectivity control for defect‐free striped...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Weinheim) 2007-08, Vol.19 (16), p.2157-2162
Hauptverfasser: Ruiz, R., Ruiz, N., Zhang, Y., Sandstrom, R. L., Black, C. T.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:Surface patterning of copolymers via self‐assembly is achieved by substrate design. The figure shows a polystyrene‐block‐poly(methyl methacrylate) symmetric diblock copolymer confined in a tapered structure. Engineering the channel structure provides local defectivity control for defect‐free striped lamellar patterns at the nanometer scale.
ISSN:0935-9648
1521-4095
DOI:10.1002/adma.200602470