Local Defectivity Control of 2D Self-Assembled Block Copolymer Patterns
Surface patterning of copolymers via self‐assembly is achieved by substrate design. The figure shows a polystyrene‐block‐poly(methyl methacrylate) symmetric diblock copolymer confined in a tapered structure. Engineering the channel structure provides local defectivity control for defect‐free striped...
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Veröffentlicht in: | Advanced materials (Weinheim) 2007-08, Vol.19 (16), p.2157-2162 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | Surface patterning of copolymers via self‐assembly is achieved by substrate design. The figure shows a polystyrene‐block‐poly(methyl methacrylate) symmetric diblock copolymer confined in a tapered structure. Engineering the channel structure provides local defectivity control for defect‐free striped lamellar patterns at the nanometer scale. |
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ISSN: | 0935-9648 1521-4095 |
DOI: | 10.1002/adma.200602470 |