Local Defectivity Control of 2D Self-Assembled Block Copolymer Patterns
Surface patterning of copolymers via self‐assembly is achieved by substrate design. The figure shows a polystyrene‐block‐poly(methyl methacrylate) symmetric diblock copolymer confined in a tapered structure. Engineering the channel structure provides local defectivity control for defect‐free striped...
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| Veröffentlicht in: | Advanced materials (Weinheim) 2007-08, Vol.19 (16), p.2157-2162 |
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| container_title | Advanced materials (Weinheim) |
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| creator | Ruiz, R. Ruiz, N. Zhang, Y. Sandstrom, R. L. Black, C. T. |
| description | Surface patterning of copolymers via self‐assembly is achieved by substrate design. The figure shows a polystyrene‐block‐poly(methyl methacrylate) symmetric diblock copolymer confined in a tapered structure. Engineering the channel structure provides local defectivity control for defect‐free striped lamellar patterns at the nanometer scale. |
| doi_str_mv | 10.1002/adma.200602470 |
| format | Article |
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| identifier | ISSN: 0935-9648 |
| ispartof | Advanced materials (Weinheim), 2007-08, Vol.19 (16), p.2157-2162 |
| issn | 0935-9648 1521-4095 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_30091130 |
| source | Access via Wiley Online Library |
| subjects | Block copolymers Epitaxial growth Nanofabrication Self-assembly Surface patterning |
| title | Local Defectivity Control of 2D Self-Assembled Block Copolymer Patterns |
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