CHEMICAL LIQUID PREPARATION METHOD, CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE

A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contai...

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Bibliographische Detailangaben
Hauptverfasser: TSUJIKAWA, Hiroki, OKAMOTO, Koichi, FUKUI, Katsuhiro, NISHIDE, Hajime, HAYASHI, Takatoshi, FUJITA, Kazuhiro, IZUTA, Takashi, MIURA, Atsuyasu, NEGORO, Sei, KOBAYASHI, Kenji
Format: Patent
Sprache:eng
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Zusammenfassung:A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.