CHEMICAL LIQUID PREPARATION METHOD, CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE
A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contai...
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| creator | TSUJIKAWA, Hiroki OKAMOTO, Koichi FUKUI, Katsuhiro NISHIDE, Hajime HAYASHI, Takatoshi FUJITA, Kazuhiro IZUTA, Takashi MIURA, Atsuyasu NEGORO, Sei KOBAYASHI, Kenji |
| description | A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration. |
| format | Patent |
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OKAMOTO, Koichi ; FUKUI, Katsuhiro ; NISHIDE, Hajime ; HAYASHI, Takatoshi ; FUJITA, Kazuhiro ; IZUTA, Takashi ; MIURA, Atsuyasu ; NEGORO, Sei ; KOBAYASHI, Kenji</creatorcontrib><description>A chemical liquid preparation method of preparing a chemical liquid for treating a film formed on a substrate, including a gas dissolving process in which an oxygen-containing gas and an inert-gas-containing gas are dissolved in the chemical liquid by supplying the oxygen-containing gas which contains oxygen gas and the inert-gas-containing gas which contains an inert gas to a chemical liquid, wherein in the gas dissolving process, a dissolved oxygen concentration in the chemical liquid is adjusted by setting a mixing ratio between the oxygen-containing gas and the inert-gas-containing gas supplied to the chemical liquid as a mixing ratio corresponding to a predetermined target dissolved oxygen concentration.</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; CONTROLLING ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; 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| language | eng |
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| subjects | BASIC ELECTRIC ELEMENTS CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY MIXING, e.g. DISSOLVING, EMULSIFYING, DISPERSING PERFORMING OPERATIONS PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS REGULATING SEMICONDUCTOR DEVICES SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TRANSPORTING |
| title | CHEMICAL LIQUID PREPARATION METHOD, CHEMICAL LIQUID PREPARATION DEVICE, AND SUBSTRATE PROCESSING DEVICE |
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