POSITIVE TYPE RADIATION SENSITIVE MIXTURE BASED ON ACID DECOMPOSABLE COMPOUND THAT FORMS AC PHOTOCHEMICALLY AND MANUFACTURE OF RELIEF PATTERN AND RELIEF IMAGE

PURPOSE: To improve the sensitivity of a radiation sensitive system by incorporating a mixture composed of a phenolic polymer and an a novolak resin respectively having a specific molecular weight into a high molecular binder. CONSTITUTION: The high molecular weight binder contains the mixture compo...

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Hauptverfasser: RAINHORUTO SHIYUBUARUMU, HORUSUTO BINDAA, RUDORUFU SHIYUUMAHAA
Format: Patent
Sprache:eng
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Zusammenfassung:PURPOSE: To improve the sensitivity of a radiation sensitive system by incorporating a mixture composed of a phenolic polymer and an a novolak resin respectively having a specific molecular weight into a high molecular binder. CONSTITUTION: The high molecular weight binder contains the mixture composed of the phenolic polymer having the molecular weight of 100-250000 and the novolak resin having the molecular weight of 300-20000. The mixture contains 40-90wt.% phenolic polymer, 5-40wt.% novolak resin and 5-20wt.% sulfonium salt expressed by formula I. Wherein, each of R-R expresses an aliphatic group and/or aromatic group having a hetero atom or two of R -R are bonded to each other to convert to one ring and in such a case, at least one of R -R has an acid decomposable group, X-expresses a non-nucleophilic ion pair. As a result, the sensitivity of the radiation sensitive system is improved.