POSITIVE TYPE RADIATION SENSITIVE MIXTURE BASED ON ACID DECOMPOSABLE COMPOUND THAT FORMS AC PHOTOCHEMICALLY AND MANUFACTURE OF RELIEF PATTERN AND RELIEF IMAGE
PURPOSE: To improve the sensitivity of a radiation sensitive system by incorporating a mixture composed of a phenolic polymer and an a novolak resin respectively having a specific molecular weight into a high molecular binder. CONSTITUTION: The high molecular weight binder contains the mixture compo...
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| creator | RAINHORUTO SHIYUBUARUMU HORUSUTO BINDAA RUDORUFU SHIYUUMAHAA |
| description | PURPOSE: To improve the sensitivity of a radiation sensitive system by incorporating a mixture composed of a phenolic polymer and an a novolak resin respectively having a specific molecular weight into a high molecular binder. CONSTITUTION: The high molecular weight binder contains the mixture composed of the phenolic polymer having the molecular weight of 100-250000 and the novolak resin having the molecular weight of 300-20000. The mixture contains 40-90wt.% phenolic polymer, 5-40wt.% novolak resin and 5-20wt.% sulfonium salt expressed by formula I. Wherein, each of R-R expresses an aliphatic group and/or aromatic group having a hetero atom or two of R -R are bonded to each other to convert to one ring and in such a case, at least one of R -R has an acid decomposable group, X-expresses a non-nucleophilic ion pair. As a result, the sensitivity of the radiation sensitive system is improved. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JPH0212153A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JPH0212153A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JPH0212153A3</originalsourceid><addsrcrecordid>eNqNjEsKwkAQRLNxIeod-gKCJniAdqbHacl8mHTErILIuBIV9Dye1RByAFdVVL2qefGNoWHhE4F0kSChZhQOHhryU-H4LG0i2GNDGoYKFWvQpIIbxrivCUbbeg1iUcCE5JqBgmiDBGXJscK67gAHwqFvDarxMRhIVDMZiChCyY_EFLHDAy2L2e1yf-fVpIsCDImy6_x69vn9ulzzI3_6Y7SbcltudxVWfyA_hFdD_w</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>POSITIVE TYPE RADIATION SENSITIVE MIXTURE BASED ON ACID DECOMPOSABLE COMPOUND THAT FORMS AC PHOTOCHEMICALLY AND MANUFACTURE OF RELIEF PATTERN AND RELIEF IMAGE</title><source>esp@cenet</source><creator>RAINHORUTO SHIYUBUARUMU ; HORUSUTO BINDAA ; RUDORUFU SHIYUUMAHAA</creator><creatorcontrib>RAINHORUTO SHIYUBUARUMU ; HORUSUTO BINDAA ; RUDORUFU SHIYUUMAHAA</creatorcontrib><description>PURPOSE: To improve the sensitivity of a radiation sensitive system by incorporating a mixture composed of a phenolic polymer and an a novolak resin respectively having a specific molecular weight into a high molecular binder. CONSTITUTION: The high molecular weight binder contains the mixture composed of the phenolic polymer having the molecular weight of 100-250000 and the novolak resin having the molecular weight of 300-20000. The mixture contains 40-90wt.% phenolic polymer, 5-40wt.% novolak resin and 5-20wt.% sulfonium salt expressed by formula I. Wherein, each of R-R expresses an aliphatic group and/or aromatic group having a hetero atom or two of R -R are bonded to each other to convert to one ring and in such a case, at least one of R -R has an acid decomposable group, X-expresses a non-nucleophilic ion pair. As a result, the sensitivity of the radiation sensitive system is improved.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>1990</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19900117&DB=EPODOC&CC=JP&NR=H0212153A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=19900117&DB=EPODOC&CC=JP&NR=H0212153A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>RAINHORUTO SHIYUBUARUMU</creatorcontrib><creatorcontrib>HORUSUTO BINDAA</creatorcontrib><creatorcontrib>RUDORUFU SHIYUUMAHAA</creatorcontrib><title>POSITIVE TYPE RADIATION SENSITIVE MIXTURE BASED ON ACID DECOMPOSABLE COMPOUND THAT FORMS AC PHOTOCHEMICALLY AND MANUFACTURE OF RELIEF PATTERN AND RELIEF IMAGE</title><description>PURPOSE: To improve the sensitivity of a radiation sensitive system by incorporating a mixture composed of a phenolic polymer and an a novolak resin respectively having a specific molecular weight into a high molecular binder. CONSTITUTION: The high molecular weight binder contains the mixture composed of the phenolic polymer having the molecular weight of 100-250000 and the novolak resin having the molecular weight of 300-20000. The mixture contains 40-90wt.% phenolic polymer, 5-40wt.% novolak resin and 5-20wt.% sulfonium salt expressed by formula I. Wherein, each of R-R expresses an aliphatic group and/or aromatic group having a hetero atom or two of R -R are bonded to each other to convert to one ring and in such a case, at least one of R -R has an acid decomposable group, X-expresses a non-nucleophilic ion pair. As a result, the sensitivity of the radiation sensitive system is improved.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>1990</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjEsKwkAQRLNxIeod-gKCJniAdqbHacl8mHTErILIuBIV9Dye1RByAFdVVL2qefGNoWHhE4F0kSChZhQOHhryU-H4LG0i2GNDGoYKFWvQpIIbxrivCUbbeg1iUcCE5JqBgmiDBGXJscK67gAHwqFvDarxMRhIVDMZiChCyY_EFLHDAy2L2e1yf-fVpIsCDImy6_x69vn9ulzzI3_6Y7SbcltudxVWfyA_hFdD_w</recordid><startdate>19900117</startdate><enddate>19900117</enddate><creator>RAINHORUTO SHIYUBUARUMU</creator><creator>HORUSUTO BINDAA</creator><creator>RUDORUFU SHIYUUMAHAA</creator><scope>EVB</scope></search><sort><creationdate>19900117</creationdate><title>POSITIVE TYPE RADIATION SENSITIVE MIXTURE BASED ON ACID DECOMPOSABLE COMPOUND THAT FORMS AC PHOTOCHEMICALLY AND MANUFACTURE OF RELIEF PATTERN AND RELIEF IMAGE</title><author>RAINHORUTO SHIYUBUARUMU ; HORUSUTO BINDAA ; RUDORUFU SHIYUUMAHAA</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JPH0212153A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>1990</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>ORIGINALS THEREFOR</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><toplevel>online_resources</toplevel><creatorcontrib>RAINHORUTO SHIYUBUARUMU</creatorcontrib><creatorcontrib>HORUSUTO BINDAA</creatorcontrib><creatorcontrib>RUDORUFU SHIYUUMAHAA</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>RAINHORUTO SHIYUBUARUMU</au><au>HORUSUTO BINDAA</au><au>RUDORUFU SHIYUUMAHAA</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>POSITIVE TYPE RADIATION SENSITIVE MIXTURE BASED ON ACID DECOMPOSABLE COMPOUND THAT FORMS AC PHOTOCHEMICALLY AND MANUFACTURE OF RELIEF PATTERN AND RELIEF IMAGE</title><date>1990-01-17</date><risdate>1990</risdate><abstract>PURPOSE: To improve the sensitivity of a radiation sensitive system by incorporating a mixture composed of a phenolic polymer and an a novolak resin respectively having a specific molecular weight into a high molecular binder. CONSTITUTION: The high molecular weight binder contains the mixture composed of the phenolic polymer having the molecular weight of 100-250000 and the novolak resin having the molecular weight of 300-20000. The mixture contains 40-90wt.% phenolic polymer, 5-40wt.% novolak resin and 5-20wt.% sulfonium salt expressed by formula I. Wherein, each of R-R expresses an aliphatic group and/or aromatic group having a hetero atom or two of R -R are bonded to each other to convert to one ring and in such a case, at least one of R -R has an acid decomposable group, X-expresses a non-nucleophilic ion pair. As a result, the sensitivity of the radiation sensitive system is improved.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS |
| title | POSITIVE TYPE RADIATION SENSITIVE MIXTURE BASED ON ACID DECOMPOSABLE COMPOUND THAT FORMS AC PHOTOCHEMICALLY AND MANUFACTURE OF RELIEF PATTERN AND RELIEF IMAGE |
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