PRODUCTION METHOD OF RESIST PATTERN

PROBLEM TO BE SOLVED: To provide a production method of a resist pattern, by which an excellent pattern can be obtained by a double patterning method.SOLUTION: The production method of a resist pattern includes the following steps (1) to (11). The steps are: (1) obtaining a first resist film; (2) pr...

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Bibliographische Detailangaben
Hauptverfasser: HATA MITSUHIRO, YASUE TAKAHIRO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a production method of a resist pattern, by which an excellent pattern can be obtained by a double patterning method.SOLUTION: The production method of a resist pattern includes the following steps (1) to (11). The steps are: (1) obtaining a first resist film; (2) prebaking the film; (3) exposing the film to light; (4) subjecting the film to post exposure baking; (5) developing to obtain a first resist pattern; (6) converting the first resist pattern to be inactive to light or to be insoluble to an alkali developing solution or a second resist composition; (7) applying the second resist composition on the first resist pattern by spin coating at a rotational speed of 300 to 3000 rpm, and drying to obtain a second resist film; (8) prebaking the obtained film; (9) exposing the film to light; (10) subjecting the film to post exposure baking; and (11) developing the film to form a second resist pattern.