PRODUCTION METHOD OF RESIST PATTERN

PROBLEM TO BE SOLVED: To provide a production method of a resist pattern, by which an excellent pattern can be obtained by a double patterning method.SOLUTION: The production method of a resist pattern includes the following steps (1) to (11). The steps are: (1) obtaining a first resist film; (2) pr...

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Bibliographische Detailangaben

Hauptverfasser:	HATA MITSUHIRO, YASUE TAKAHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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