PHOTOSENSITIVE POLYMER FOR EXTREME ULTRAVIOLET RAY AND DEEP ULTRAVIOLET RAY AND PHOTORESIST COMPOSITION CONTAINING THE SAME

PROBLEM TO BE SOLVED: To provide a photosensitive polymer able to form fine patterns responding to extreme ultraviolet rays and deep ultraviolet rays, greatly reduce LER (line edge roughness) after development and improve safety of the line width of a formed pattern and a photoresist composition con...

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Hauptverfasser: KIM DEOG-BAE, KIM JAE-HYUN
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a photosensitive polymer able to form fine patterns responding to extreme ultraviolet rays and deep ultraviolet rays, greatly reduce LER (line edge roughness) after development and improve safety of the line width of a formed pattern and a photoresist composition containing the same. SOLUTION: The photosensitive polymer for extreme ultraviolet rays and deep ultraviolet rays comprises a repeating unit expressed by chemical formula (1) [wherein R1and R1' express each independently H, methyl or trifluoromethyl; R2expresses chemical formula (1-1)]. COPYRIGHT: (C)2008,JPO&INPIT