Novel naphthalimide sulfonate derivative, and photoacid generator and photoresist composition comprising same
The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition comprising the naphthalimide sulfonate derivative, and more particularly, to a photoresist composition comprising the naphthalimide sulfonate derivative, the present inventi...
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Format: | Patent |
Sprache: | chi ; eng |
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Zusammenfassung: | The present invention relates to a naphthalimide sulfonate derivative, and a photoacid generator and a photoresist composition comprising the naphthalimide sulfonate derivative, and more particularly, to a photoresist composition comprising the naphthalimide sulfonate derivative, the present invention relates to a naphthalimide sulfonate derivative compound, and more specifically, to a naphthalimide sulfonate derivative compound having excellent absorbance with respect to light having an i-line (365 nm) wavelength, having high solubility in an organic solvent, and having excellent light absorption properties, and a photoacid generator and a photoresist composition comprising the naphthalimide sulfonate derivative compound, and to a photoresist composition comprising the naphthalimide sulfonate derivative compound. In addition, excellent thermal stability is achieved, and good acid production rate is shown.
本发明涉及一种萘二甲酰亚胺磺酸酯衍生物以及包含该萘二甲酰亚胺磺酸酯衍生物的光致产酸剂和光刻胶组合物,更详细地,涉及一种如下的萘二甲酰亚胺磺酸酯衍生物化合物以及包含该萘二甲酰亚胺磺酸酯衍生物化合物的光致产酸剂和 |
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