Computational lithography
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since t...
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| Format: | Elektronisch E-Book |
| Sprache: | English |
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Hoboken, N.J.
Wiley
2010
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| Schriftenreihe: | Wiley series in pure and applied optics
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| Online-Zugang: | lizenzpflichtig |
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| 245 | 1 | 0 | |a Computational lithography |c Xu Ma and Gonzalo R. Arce |
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| 300 | |a 1 online resource (xv, 226 pages) |b illustrations | ||
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| 520 | |a A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting. | ||
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| 650 | 0 | |a Resolution (Optics) | |
| 650 | 4 | |a Microlithographie ; Mathématiques | |
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| 650 | 4 | |a Photolithographie ; Mathématiques | |
| 650 | 4 | |a Semi-conducteurs ; Attaque chimique ; Mathématiques | |
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| 650 | 4 | |a resolution (optical concept) | |
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| 650 | 4 | |a Resolution (Optics) | |
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| id | ZDB-30-ORH-047524871 |
| illustrated | Illustrated |
| indexdate | 2024-12-18T08:48:05Z |
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| language | English |
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| physical | 1 online resource (xv, 226 pages) illustrations |
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| publishDate | 2010 |
| publishDateSearch | 2010 |
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| publisher | Wiley |
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| series2 | Wiley series in pure and applied optics |
| spelling | Ma, Xu 1983- VerfasserIn aut Computational lithography Xu Ma and Gonzalo R. Arce Hoboken, N.J. Wiley 2010 1 online resource (xv, 226 pages) illustrations Text txt rdacontent Computermedien c rdamedia Online-Ressource cr rdacarrier Wiley series in pure and applied optics Includes bibliographical references and index. - Print version record A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting. Microlithography Mathematics Integrated circuits Design and construction Mathematics Photolithography Mathematics Semiconductors Etching Mathematics Resolution (Optics) Microlithographie ; Mathématiques Circuits intégrés ; Conception et construction ; Mathématiques Photolithographie ; Mathématiques Semi-conducteurs ; Attaque chimique ; Mathématiques Résolution (Optique) resolution (optical concept) TECHNOLOGY & ENGINEERING ; Electronics ; Circuits ; General Arce, Gonzalo R. MitwirkendeR ctb 9780470596975 Erscheint auch als Druck-Ausgabe 9780470596975 TUM01 ZDB-30-ORH TUM_PDA_ORH https://learning.oreilly.com/library/view/-/9781118043578/?ar X:ORHE Aggregator lizenzpflichtig Volltext |
| spellingShingle | Ma, Xu 1983- Computational lithography Microlithography Mathematics Integrated circuits Design and construction Mathematics Photolithography Mathematics Semiconductors Etching Mathematics Resolution (Optics) Microlithographie ; Mathématiques Circuits intégrés ; Conception et construction ; Mathématiques Photolithographie ; Mathématiques Semi-conducteurs ; Attaque chimique ; Mathématiques Résolution (Optique) resolution (optical concept) TECHNOLOGY & ENGINEERING ; Electronics ; Circuits ; General |
| title | Computational lithography |
| title_auth | Computational lithography |
| title_exact_search | Computational lithography |
| title_full | Computational lithography Xu Ma and Gonzalo R. Arce |
| title_fullStr | Computational lithography Xu Ma and Gonzalo R. Arce |
| title_full_unstemmed | Computational lithography Xu Ma and Gonzalo R. Arce |
| title_short | Computational lithography |
| title_sort | computational lithography |
| topic | Microlithography Mathematics Integrated circuits Design and construction Mathematics Photolithography Mathematics Semiconductors Etching Mathematics Resolution (Optics) Microlithographie ; Mathématiques Circuits intégrés ; Conception et construction ; Mathématiques Photolithographie ; Mathématiques Semi-conducteurs ; Attaque chimique ; Mathématiques Résolution (Optique) resolution (optical concept) TECHNOLOGY & ENGINEERING ; Electronics ; Circuits ; General |
| topic_facet | Microlithography Mathematics Integrated circuits Design and construction Mathematics Photolithography Mathematics Semiconductors Etching Mathematics Resolution (Optics) Microlithographie ; Mathématiques Circuits intégrés ; Conception et construction ; Mathématiques Photolithographie ; Mathématiques Semi-conducteurs ; Attaque chimique ; Mathématiques Résolution (Optique) resolution (optical concept) TECHNOLOGY & ENGINEERING ; Electronics ; Circuits ; General |
| url | https://learning.oreilly.com/library/view/-/9781118043578/?ar |
| work_keys_str_mv | AT maxu computationallithography AT arcegonzalor computationallithography |