Ultra clean processing of semiconductor surfaces XI selected, peer reviewed papers from the 11th international symposium on ultra clean processing of semiconductor surfaces (UCPSS), September 17-19, 2012, Gent, Belgium
This volume covers various aspects of ultra-clean technology for the large-scale integration of semiconductors. These include cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing, as well as cleaning for semiconductor photo-voltaic applications....
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| Weitere Verfasser: | , , |
| Format: | Tagungsbericht E-Book |
| Sprache: | English |
| Veröffentlicht: |
Durnten-Zurich, Switzerland
Trans Tech Publications Ltd.
[2013]
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| Schriftenreihe: | Solid state phenomena
v. 195 |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | This volume covers various aspects of ultra-clean technology for the large-scale integration of semiconductors. These include cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing, as well as cleaning for semiconductor photo-voltaic applications. Also covered are studies of general topics such as particle removal using acoustic enhancement, the removal of metallic contamination, pattern collapse of fine flexible and fragile features, wetting and drying, contamination control and contamination metrology. The FEOL and BEOL contributions also t. |
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| Beschreibung: | 1 Online-Ressource (328 Seiten) Illustrationen |
| ISBN: | 1680151096 3038139084 9781680151091 9783038139089 |
| ISSN: | 1012-0394 |