EUV lithography
"Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, mask...
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| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
Bellingham, Washington, USA
SPIE Press
[2018]
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| Ausgabe: | Second edition |
| Schlagworte: | |
| Online-Zugang: | DE-1050 DE-92 URL des Erstveröffentlichers |
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MARC
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| 520 | |a "Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL in field. It thoroughly covers the current in-field version of EUVL plus related topics, including light sources, optics, mask, photoresists, contamination, imaging and scanners. In the nine years since SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for NGL. In 2008, EUVL was a prime contender to replace 193 nm based optical lithography in leading edge computer chipmaking, but not everyone was convinced at that point. Switching from 193 nm to 13.5 nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography - light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing"... | ||
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Datensatz im Suchindex
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| dewey-search | 621.3815 |
| dewey-sort | 3621.3815 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Elektrotechnik / Elektronik / Nachrichtentechnik |
| doi_str_mv | 10.1117/3.2305675 |
| edition | Second edition |
| format | Electronic eBook |
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| id | DE-604.BV044789355 |
| illustrated | Not Illustrated |
| indexdate | 2024-12-24T06:20:57Z |
| institution | BVB |
| isbn | 9781510616790 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-030184613 |
| oclc_num | 1024095562 |
| open_access_boolean | |
| owner | DE-1050 DE-92 |
| owner_facet | DE-1050 DE-92 |
| physical | 1 Online-Ressource |
| psigel | ZDB-50-SPI |
| publishDate | 2018 |
| publishDateSearch | 2018 |
| publishDateSort | 2018 |
| publisher | SPIE Press |
| record_format | marc |
| spelling | EUV lithography Vivek Bakshi, editor Second edition Bellingham, Washington, USA SPIE Press [2018] © 2018 1 Online-Ressource txt rdacontent c rdamedia cr rdacarrier "Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This book covers the fundamental and latest status of all aspects of EUVL in field. It thoroughly covers the current in-field version of EUVL plus related topics, including light sources, optics, mask, photoresists, contamination, imaging and scanners. In the nine years since SPIE Press published the first edition of EUVL Lithography, much progress has taken place in the development of EUVL as the choice technology for NGL. In 2008, EUVL was a prime contender to replace 193 nm based optical lithography in leading edge computer chipmaking, but not everyone was convinced at that point. Switching from 193 nm to 13.5 nm wavelengths was a much bigger jump than the industry had attempted before. It brought several difficult challenges in all areas of lithography - light source, scanner, mask, mask handling, optics, optics metrology, resist, computation, materials and optics contamination. These challenges have been effectively resolved, and several leading-edge chipmakers have announced dates, starting in 2018, for inserting EUVL into high-volume manufacturing"... Ultraviolet radiation Industrial applications Photolithography Optical coatings Fotolithografie (DE-588)4274823-9 gnd rswk-swf Fotolithografie (DE-588)4274823-9 s DE-604 Bakshi, Vivek edt Erscheint auch als Online-Ausgabe, ePub 978-1-5106-1680-6 Erscheint auch als Online-Ausgabe, Kindle 978-1-5106-1681-3 Erscheint auch als Druck-Ausgabe, hardcover 978-1-5106-1678-3 https://doi.org/10.1117/3.2305675 Verlag URL des Erstveröffentlichers Volltext |
| spellingShingle | EUV lithography Ultraviolet radiation Industrial applications Photolithography Optical coatings Fotolithografie (DE-588)4274823-9 gnd |
| subject_GND | (DE-588)4274823-9 |
| title | EUV lithography |
| title_auth | EUV lithography |
| title_exact_search | EUV lithography |
| title_full | EUV lithography Vivek Bakshi, editor |
| title_fullStr | EUV lithography Vivek Bakshi, editor |
| title_full_unstemmed | EUV lithography Vivek Bakshi, editor |
| title_short | EUV lithography |
| title_sort | euv lithography |
| topic | Ultraviolet radiation Industrial applications Photolithography Optical coatings Fotolithografie (DE-588)4274823-9 gnd |
| topic_facet | Ultraviolet radiation Industrial applications Photolithography Optical coatings Fotolithografie |
| url | https://doi.org/10.1117/3.2305675 |
| work_keys_str_mv | AT bakshivivek euvlithography |