Handbook of VLSI microlithography principles, technology, and applications

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Veröffentlicht: Park Ridge, N.J., U.S.A. Noyes Publications ©1991
Schriftenreihe:Materials science and process technology series
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245 1 0 |a Handbook of VLSI microlithography  |b principles, technology, and applications  |c edited by William B. Glendinning, John N. Helbert 
264 1 |a Park Ridge, N.J., U.S.A.  |b Noyes Publications  |c ©1991 
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490 0 |a Materials science and process technology series 
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Datensatz im Suchindex

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9780815512813
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language English
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series2 Materials science and process technology series
spelling Handbook of VLSI microlithography principles, technology, and applications edited by William B. Glendinning, John N. Helbert
Park Ridge, N.J., U.S.A. Noyes Publications ©1991
1 Online-Ressource (xxii, 649 pages)
txt rdacontent
c rdamedia
cr rdacarrier
Materials science and process technology series
Includes bibliographical references and index
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook
TECHNOLOGY & ENGINEERING / Mechanical bisacsh
Lithographie (Halbleitertechnologie) swd
Photolithographie (Halbleitertechnologie) swd
VLSI. swd
Integrated circuits / Very large scale integration fast
Microlithography fast
Integrated circuits Very large scale integration
Microlithography
Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd rswk-swf
Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd rswk-swf
VLSI (DE-588)4117388-0 gnd rswk-swf
Elektronenstrahllithografie (DE-588)4151897-4 gnd rswk-swf
VLSI (DE-588)4117388-0 s
Lithografie Halbleitertechnologie (DE-588)4191584-7 s
1\p DE-604
Fotolithografie Halbleitertechnologie (DE-588)4174516-4 s
2\p DE-604
Elektronenstrahllithografie (DE-588)4151897-4 s
3\p DE-604
Glendinning, William B. Sonstige oth
Helbert, John N. Sonstige oth
http://www.sciencedirect.com/science/book/9780815512813 Verlag Volltext
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spellingShingle Handbook of VLSI microlithography principles, technology, and applications
TECHNOLOGY & ENGINEERING / Mechanical bisacsh
Lithographie (Halbleitertechnologie) swd
Photolithographie (Halbleitertechnologie) swd
VLSI. swd
Integrated circuits / Very large scale integration fast
Microlithography fast
Integrated circuits Very large scale integration
Microlithography
Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd
Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd
VLSI (DE-588)4117388-0 gnd
Elektronenstrahllithografie (DE-588)4151897-4 gnd
subject_GND (DE-588)4174516-4
(DE-588)4191584-7
(DE-588)4117388-0
(DE-588)4151897-4
title Handbook of VLSI microlithography principles, technology, and applications
title_auth Handbook of VLSI microlithography principles, technology, and applications
title_exact_search Handbook of VLSI microlithography principles, technology, and applications
title_full Handbook of VLSI microlithography principles, technology, and applications edited by William B. Glendinning, John N. Helbert
title_fullStr Handbook of VLSI microlithography principles, technology, and applications edited by William B. Glendinning, John N. Helbert
title_full_unstemmed Handbook of VLSI microlithography principles, technology, and applications edited by William B. Glendinning, John N. Helbert
title_short Handbook of VLSI microlithography
title_sort handbook of vlsi microlithography principles technology and applications
title_sub principles, technology, and applications
topic TECHNOLOGY & ENGINEERING / Mechanical bisacsh
Lithographie (Halbleitertechnologie) swd
Photolithographie (Halbleitertechnologie) swd
VLSI. swd
Integrated circuits / Very large scale integration fast
Microlithography fast
Integrated circuits Very large scale integration
Microlithography
Fotolithografie Halbleitertechnologie (DE-588)4174516-4 gnd
Lithografie Halbleitertechnologie (DE-588)4191584-7 gnd
VLSI (DE-588)4117388-0 gnd
Elektronenstrahllithografie (DE-588)4151897-4 gnd
topic_facet TECHNOLOGY & ENGINEERING / Mechanical
Lithographie (Halbleitertechnologie)
Photolithographie (Halbleitertechnologie)
VLSI.
Integrated circuits / Very large scale integration
Microlithography
Integrated circuits Very large scale integration
Fotolithografie Halbleitertechnologie
Lithografie Halbleitertechnologie
VLSI
Elektronenstrahllithografie
url http://www.sciencedirect.com/science/book/9780815512813
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