Study of the N yield in a microwave plasma for the deposition of CNH materials measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms
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| 1. Verfasser: | |
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| Format: | Elektronisch E-Book |
| Sprache: | English |
| Veröffentlicht: |
2001
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| Schlagworte: | |
| Online-Zugang: | http://www-brs.ub.ruhr-uni-bochum.de/netahtml/HSS/Diss/DouaiDavid/diss.pdf http://d-nb.info/963172050/34 |
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| 245 | 1 | 0 | |a Study of the N yield in a microwave plasma for the deposition of CNH materials |b measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms |c von David Douai |
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Datensatz im Suchindex
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| author | Douai, David 1969- |
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| illustrated | Not Illustrated |
| indexdate | 2025-02-03T16:57:40Z |
| institution | BVB |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-009684678 |
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| physical | 1 Online-Ressource |
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| publishDate | 2001 |
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| spellingShingle | Douai, David 1969- Study of the N yield in a microwave plasma for the deposition of CNH materials measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms Stickstoffatom (DE-588)4563955-3 gnd Quadrupolmassenspektrometrie (DE-588)4176579-5 gnd Boltzmann-Gleichung (DE-588)4146261-0 gnd Mikrowellenplasma (DE-588)4417807-4 gnd Plasmaätzen (DE-588)4174821-9 gnd |
| subject_GND | (DE-588)4563955-3 (DE-588)4176579-5 (DE-588)4146261-0 (DE-588)4417807-4 (DE-588)4174821-9 (DE-588)4113937-9 |
| title | Study of the N yield in a microwave plasma for the deposition of CNH materials measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms |
| title_auth | Study of the N yield in a microwave plasma for the deposition of CNH materials measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms |
| title_exact_search | Study of the N yield in a microwave plasma for the deposition of CNH materials measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms |
| title_full | Study of the N yield in a microwave plasma for the deposition of CNH materials measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms von David Douai |
| title_fullStr | Study of the N yield in a microwave plasma for the deposition of CNH materials measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms von David Douai |
| title_full_unstemmed | Study of the N yield in a microwave plasma for the deposition of CNH materials measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms von David Douai |
| title_short | Study of the N yield in a microwave plasma for the deposition of CNH materials |
| title_sort | study of the n yield in a microwave plasma for the deposition of cnh materials measurement in the remote plasma kinetic study and etching of a c h films by n atoms |
| title_sub | measurement in the remote plasma, kinetic study and etching of a-C:H films by N atoms |
| topic | Stickstoffatom (DE-588)4563955-3 gnd Quadrupolmassenspektrometrie (DE-588)4176579-5 gnd Boltzmann-Gleichung (DE-588)4146261-0 gnd Mikrowellenplasma (DE-588)4417807-4 gnd Plasmaätzen (DE-588)4174821-9 gnd |
| topic_facet | Stickstoffatom Quadrupolmassenspektrometrie Boltzmann-Gleichung Mikrowellenplasma Plasmaätzen Hochschulschrift |
| url | http://www-brs.ub.ruhr-uni-bochum.de/netahtml/HSS/Diss/DouaiDavid/diss.pdf http://d-nb.info/963172050/34 |
| work_keys_str_mv | AT douaidavid studyofthenyieldinamicrowaveplasmaforthedepositionofcnhmaterialsmeasurementintheremoteplasmakineticstudyandetchingofachfilmsbynatoms |