Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A.

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Veröffentlicht: Warrendale, Pa. Materials Research Soc. 2001
Schriftenreihe:Materials Research Society symposia proceedings 612
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physical Getr. Zählung Ill., graph. Darst.
publishDate 2001
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series Materials Research Society symposia proceedings
series2 Materials Research Society symposia proceedings
spelling Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. ed. G. S. Oehrlein ...
Warrendale, Pa. Materials Research Soc. 2001
Getr. Zählung Ill., graph. Darst.
txt rdacontent
n rdamedia
nc rdacarrier
Materials Research Society symposia proceedings 612
Dielectric films Congresses
Integrated circuits Materials Congresses
Integrated circuits Reliability Congresses
Semiconductors Junctions Congresses
Semiconductors Materials Congresses
Halbleitergrenzfläche (DE-588)4158802-2 gnd rswk-swf
(DE-588)1071861417 Konferenzschrift 2000 San Francisco Calif. gnd-content
Halbleitergrenzfläche (DE-588)4158802-2 s
DE-604
Oehrlein, G. S. Sonstige oth
Materials Research Society symposia proceedings 612 (DE-604)BV001899105 612
spellingShingle Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A.
Materials Research Society symposia proceedings
Dielectric films Congresses
Integrated circuits Materials Congresses
Integrated circuits Reliability Congresses
Semiconductors Junctions Congresses
Semiconductors Materials Congresses
Halbleitergrenzfläche (DE-588)4158802-2 gnd
subject_GND (DE-588)4158802-2
(DE-588)1071861417
title Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A.
title_auth Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A.
title_exact_search Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A.
title_full Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. ed. G. S. Oehrlein ...
title_fullStr Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. ed. G. S. Oehrlein ...
title_full_unstemmed Materials, technology and reliability for advanced interconnects and low-k dielectrics symposium held April 23 - 27, 2000, San Francisco, California, U.S.A. ed. G. S. Oehrlein ...
title_short Materials, technology and reliability for advanced interconnects and low-k dielectrics
title_sort materials technology and reliability for advanced interconnects and low k dielectrics symposium held april 23 27 2000 san francisco california u s a
title_sub symposium held April 23 - 27, 2000, San Francisco, California, U.S.A.
topic Dielectric films Congresses
Integrated circuits Materials Congresses
Integrated circuits Reliability Congresses
Semiconductors Junctions Congresses
Semiconductors Materials Congresses
Halbleitergrenzfläche (DE-588)4158802-2 gnd
topic_facet Dielectric films Congresses
Integrated circuits Materials Congresses
Integrated circuits Reliability Congresses
Semiconductors Junctions Congresses
Semiconductors Materials Congresses
Halbleitergrenzfläche
Konferenzschrift 2000 San Francisco Calif.
volume_link (DE-604)BV001899105
work_keys_str_mv AT oehrleings materialstechnologyandreliabilityforadvancedinterconnectsandlowkdielectricssymposiumheldapril23272000sanfranciscocaliforniausa