Techniques and challenges for 300 mm silicon processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998
Gespeichert in:
| Format: | Tagungsbericht Buch |
|---|---|
| Sprache: | English |
| Veröffentlicht: |
Amsterdam [u.a.]
Elsevier
1999
|
| Schriftenreihe: | European Materials Research Society: European Materials Research Society symposia proceedings
81 |
| Schlagworte: | |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
MARC
| LEADER | 00000nam a2200000 cb4500 | ||
|---|---|---|---|
| 001 | BV013071466 | ||
| 003 | DE-604 | ||
| 005 | 20000328 | ||
| 007 | t | ||
| 008 | 000328s1999 ne ad|| |||| 10||| eng d | ||
| 020 | |a 0080436099 |9 0-08-043609-9 | ||
| 035 | |a (OCoLC)46812078 | ||
| 035 | |a (DE-599)BVBBV013071466 | ||
| 040 | |a DE-604 |b ger |e rakwb | ||
| 041 | 0 | |a eng | |
| 044 | |a ne |c NL | ||
| 049 | |a DE-703 | ||
| 050 | 0 | |a TK7871.85 | |
| 082 | 0 | |a 621.3815/2 |2 21 | |
| 084 | |a UP 3100 |0 (DE-625)146372: |2 rvk | ||
| 245 | 1 | 0 | |a Techniques and challenges for 300 mm silicon |b processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998 |c ed. by H. Richter ... |
| 264 | 1 | |a Amsterdam [u.a.] |b Elsevier |c 1999 | |
| 300 | |a VI, S. 85 - 297 |b Ill., graph. Darst. | ||
| 336 | |b txt |2 rdacontent | ||
| 337 | |b n |2 rdamedia | ||
| 338 | |b nc |2 rdacarrier | ||
| 490 | 1 | |a European Materials Research Society: European Materials Research Society symposia proceedings |v 81 | |
| 500 | |a Aus: Microelectronic engineering ; 45,2-3 | ||
| 650 | 4 | |a Semiconductor wafers |v Congresses | |
| 650 | 0 | 7 | |a Wafer |0 (DE-588)4294605-0 |2 gnd |9 rswk-swf |
| 650 | 0 | 7 | |a Silicium |0 (DE-588)4077445-4 |2 gnd |9 rswk-swf |
| 655 | 7 | |0 (DE-588)1071861417 |a Konferenzschrift |y 1998 |z Straßburg |2 gnd-content | |
| 689 | 0 | 0 | |a Silicium |0 (DE-588)4077445-4 |D s |
| 689 | 0 | 1 | |a Wafer |0 (DE-588)4294605-0 |D s |
| 689 | 0 | |5 DE-604 | |
| 700 | 1 | |a Richter, H. |e Sonstige |4 oth | |
| 711 | 2 | |a Conference on Techniques and Challenges for 300 mm Silicon: Processing, Characterization, Modeling and Equipment |d 1998 |c Straßburg |j Sonstige |0 (DE-588)5341647-8 |4 oth | |
| 830 | 0 | |a European Materials Research Society: European Materials Research Society symposia proceedings |v 81 |w (DE-604)BV004201591 |9 81 | |
| 999 | |a oai:aleph.bib-bvb.de:BVB01-008905902 | ||
Datensatz im Suchindex
| _version_ | 1804127769363218432 |
|---|---|
| any_adam_object | |
| building | Verbundindex |
| bvnumber | BV013071466 |
| callnumber-first | T - Technology |
| callnumber-label | TK7871 |
| callnumber-raw | TK7871.85 |
| callnumber-search | TK7871.85 |
| callnumber-sort | TK 47871.85 |
| callnumber-subject | TK - Electrical and Nuclear Engineering |
| classification_rvk | UP 3100 |
| ctrlnum | (OCoLC)46812078 (DE-599)BVBBV013071466 |
| dewey-full | 621.3815/2 |
| dewey-hundreds | 600 - Technology (Applied sciences) |
| dewey-ones | 621 - Applied physics |
| dewey-raw | 621.3815/2 |
| dewey-search | 621.3815/2 |
| dewey-sort | 3621.3815 12 |
| dewey-tens | 620 - Engineering and allied operations |
| discipline | Physik Elektrotechnik / Elektronik / Nachrichtentechnik |
| format | Conference Proceeding Book |
| fullrecord | <?xml version="1.0" encoding="UTF-8"?><collection xmlns="http://www.loc.gov/MARC21/slim"><record><leader>01917nam a2200433 cb4500</leader><controlfield tag="001">BV013071466</controlfield><controlfield tag="003">DE-604</controlfield><controlfield tag="005">20000328 </controlfield><controlfield tag="007">t</controlfield><controlfield tag="008">000328s1999 ne ad|| |||| 10||| eng d</controlfield><datafield tag="020" ind1=" " ind2=" "><subfield code="a">0080436099</subfield><subfield code="9">0-08-043609-9</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(OCoLC)46812078</subfield></datafield><datafield tag="035" ind1=" " ind2=" "><subfield code="a">(DE-599)BVBBV013071466</subfield></datafield><datafield tag="040" ind1=" " ind2=" "><subfield code="a">DE-604</subfield><subfield code="b">ger</subfield><subfield code="e">rakwb</subfield></datafield><datafield tag="041" ind1="0" ind2=" "><subfield code="a">eng</subfield></datafield><datafield tag="044" ind1=" " ind2=" "><subfield code="a">ne</subfield><subfield code="c">NL</subfield></datafield><datafield tag="049" ind1=" " ind2=" "><subfield code="a">DE-703</subfield></datafield><datafield tag="050" ind1=" " ind2="0"><subfield code="a">TK7871.85</subfield></datafield><datafield tag="082" ind1="0" ind2=" "><subfield code="a">621.3815/2</subfield><subfield code="2">21</subfield></datafield><datafield tag="084" ind1=" " ind2=" "><subfield code="a">UP 3100</subfield><subfield code="0">(DE-625)146372:</subfield><subfield code="2">rvk</subfield></datafield><datafield tag="245" ind1="1" ind2="0"><subfield code="a">Techniques and challenges for 300 mm silicon</subfield><subfield code="b">processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998</subfield><subfield code="c">ed. by H. Richter ...</subfield></datafield><datafield tag="264" ind1=" " ind2="1"><subfield code="a">Amsterdam [u.a.]</subfield><subfield code="b">Elsevier</subfield><subfield code="c">1999</subfield></datafield><datafield tag="300" ind1=" " ind2=" "><subfield code="a">VI, S. 85 - 297</subfield><subfield code="b">Ill., graph. Darst.</subfield></datafield><datafield tag="336" ind1=" " ind2=" "><subfield code="b">txt</subfield><subfield code="2">rdacontent</subfield></datafield><datafield tag="337" ind1=" " ind2=" "><subfield code="b">n</subfield><subfield code="2">rdamedia</subfield></datafield><datafield tag="338" ind1=" " ind2=" "><subfield code="b">nc</subfield><subfield code="2">rdacarrier</subfield></datafield><datafield tag="490" ind1="1" ind2=" "><subfield code="a">European Materials Research Society: European Materials Research Society symposia proceedings</subfield><subfield code="v">81</subfield></datafield><datafield tag="500" ind1=" " ind2=" "><subfield code="a">Aus: Microelectronic engineering ; 45,2-3</subfield></datafield><datafield tag="650" ind1=" " ind2="4"><subfield code="a">Semiconductor wafers</subfield><subfield code="v">Congresses</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Wafer</subfield><subfield code="0">(DE-588)4294605-0</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="650" ind1="0" ind2="7"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="2">gnd</subfield><subfield code="9">rswk-swf</subfield></datafield><datafield tag="655" ind1=" " ind2="7"><subfield code="0">(DE-588)1071861417</subfield><subfield code="a">Konferenzschrift</subfield><subfield code="y">1998</subfield><subfield code="z">Straßburg</subfield><subfield code="2">gnd-content</subfield></datafield><datafield tag="689" ind1="0" ind2="0"><subfield code="a">Silicium</subfield><subfield code="0">(DE-588)4077445-4</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2="1"><subfield code="a">Wafer</subfield><subfield code="0">(DE-588)4294605-0</subfield><subfield code="D">s</subfield></datafield><datafield tag="689" ind1="0" ind2=" "><subfield code="5">DE-604</subfield></datafield><datafield tag="700" ind1="1" ind2=" "><subfield code="a">Richter, H.</subfield><subfield code="e">Sonstige</subfield><subfield code="4">oth</subfield></datafield><datafield tag="711" ind1="2" ind2=" "><subfield code="a">Conference on Techniques and Challenges for 300 mm Silicon: Processing, Characterization, Modeling and Equipment</subfield><subfield code="d">1998</subfield><subfield code="c">Straßburg</subfield><subfield code="j">Sonstige</subfield><subfield code="0">(DE-588)5341647-8</subfield><subfield code="4">oth</subfield></datafield><datafield tag="830" ind1=" " ind2="0"><subfield code="a">European Materials Research Society: European Materials Research Society symposia proceedings</subfield><subfield code="v">81</subfield><subfield code="w">(DE-604)BV004201591</subfield><subfield code="9">81</subfield></datafield><datafield tag="999" ind1=" " ind2=" "><subfield code="a">oai:aleph.bib-bvb.de:BVB01-008905902</subfield></datafield></record></collection> |
| genre | (DE-588)1071861417 Konferenzschrift 1998 Straßburg gnd-content |
| genre_facet | Konferenzschrift 1998 Straßburg |
| id | DE-604.BV013071466 |
| illustrated | Illustrated |
| indexdate | 2024-07-09T18:38:37Z |
| institution | BVB |
| institution_GND | (DE-588)5341647-8 |
| isbn | 0080436099 |
| language | English |
| oai_aleph_id | oai:aleph.bib-bvb.de:BVB01-008905902 |
| oclc_num | 46812078 |
| open_access_boolean | |
| owner | DE-703 |
| owner_facet | DE-703 |
| physical | VI, S. 85 - 297 Ill., graph. Darst. |
| publishDate | 1999 |
| publishDateSearch | 1999 |
| publishDateSort | 1999 |
| publisher | Elsevier |
| record_format | marc |
| series | European Materials Research Society: European Materials Research Society symposia proceedings |
| series2 | European Materials Research Society: European Materials Research Society symposia proceedings |
| spelling | Techniques and challenges for 300 mm silicon processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998 ed. by H. Richter ... Amsterdam [u.a.] Elsevier 1999 VI, S. 85 - 297 Ill., graph. Darst. txt rdacontent n rdamedia nc rdacarrier European Materials Research Society: European Materials Research Society symposia proceedings 81 Aus: Microelectronic engineering ; 45,2-3 Semiconductor wafers Congresses Wafer (DE-588)4294605-0 gnd rswk-swf Silicium (DE-588)4077445-4 gnd rswk-swf (DE-588)1071861417 Konferenzschrift 1998 Straßburg gnd-content Silicium (DE-588)4077445-4 s Wafer (DE-588)4294605-0 s DE-604 Richter, H. Sonstige oth Conference on Techniques and Challenges for 300 mm Silicon: Processing, Characterization, Modeling and Equipment 1998 Straßburg Sonstige (DE-588)5341647-8 oth European Materials Research Society: European Materials Research Society symposia proceedings 81 (DE-604)BV004201591 81 |
| spellingShingle | Techniques and challenges for 300 mm silicon processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998 European Materials Research Society: European Materials Research Society symposia proceedings Semiconductor wafers Congresses Wafer (DE-588)4294605-0 gnd Silicium (DE-588)4077445-4 gnd |
| subject_GND | (DE-588)4294605-0 (DE-588)4077445-4 (DE-588)1071861417 |
| title | Techniques and challenges for 300 mm silicon processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998 |
| title_auth | Techniques and challenges for 300 mm silicon processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998 |
| title_exact_search | Techniques and challenges for 300 mm silicon processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998 |
| title_full | Techniques and challenges for 300 mm silicon processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998 ed. by H. Richter ... |
| title_fullStr | Techniques and challenges for 300 mm silicon processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998 ed. by H. Richter ... |
| title_full_unstemmed | Techniques and challenges for 300 mm silicon processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998 ed. by H. Richter ... |
| title_short | Techniques and challenges for 300 mm silicon |
| title_sort | techniques and challenges for 300 mm silicon processing characterization modelling and equipment proceedings of symposium f on techniques and challenges for 300 mm silicon of the e mrs 1998 spring conference strasbourg france 16 19 june 1998 |
| title_sub | processing, characterization, modelling and equipment ; proceedings of Symposium F on Techniques and Challenges for 300 mm Silicon of the E-MRS 1998 Spring Conference ; Strasbourg, France, 16 - 19 June 1998 |
| topic | Semiconductor wafers Congresses Wafer (DE-588)4294605-0 gnd Silicium (DE-588)4077445-4 gnd |
| topic_facet | Semiconductor wafers Congresses Wafer Silicium Konferenzschrift 1998 Straßburg |
| volume_link | (DE-604)BV004201591 |
| work_keys_str_mv | AT richterh techniquesandchallengesfor300mmsiliconprocessingcharacterizationmodellingandequipmentproceedingsofsymposiumfontechniquesandchallengesfor300mmsiliconoftheemrs1998springconferencestrasbourgfrance1619june1998 AT conferenceontechniquesandchallengesfor300mmsiliconprocessingcharacterizationmodelingandequipmentstraßburg techniquesandchallengesfor300mmsiliconprocessingcharacterizationmodellingandequipmentproceedingsofsymposiumfontechniquesandchallengesfor300mmsiliconoftheemrs1998springconferencestrasbourgfrance1619june1998 |