Sub‐100 nm, Centimeter‐Scale, Parallel Dip‐Pen Nanolithography

Sub‐100 nm, Centimeter‐Scale, Parallel Dip‐Pen Nanolithography

Atomic force microscope (AFM) cantilever linear arrays are used for parallel dip‐pen nanolithography (DPN). Three different tip configurations are studied, all of which involve only a single feedback system in a conventional AFM instrument or an Nscriptor, a dedicated instrument designed for DPN. A...

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Veröffentlicht in:Small (Weinheim an der Bergstrasse, Germany) Germany), 2005-10, Vol.1 (10), p.940-945
Hauptverfasser: Salaita, Khalid, Lee, Seung Woo, Wang, Xuefang, Huang, Ling, Dellinger, Timothy M., Liu, Chang, Mirkin, Chad A.
Format: Artikel
Sprache:eng
Schlagworte:
atomic force microscopy
dip‐pen nanolithography
nanostructures
patterning
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Zusammenfassung:Atomic force microscope (AFM) cantilever linear arrays are used for parallel dip‐pen nanolithography (DPN). Three different tip configurations are studied, all of which involve only a single feedback system in a conventional AFM instrument or an Nscriptor, a dedicated instrument designed for DPN. A simple and convenient tip–substrate alignment procedure provides centimeter‐scale, sub‐100 nm resolution patterning (see micrograph image).
ISSN:1613-6810
1613-6829
DOI:10.1002/smll.200500202