Off‐Stoichiometry of Magnetron Sputtered Ba1−xSrxTiO3 Thin Films (Phys. Status Solidi B 10/2019)

Off‐Stoichiometry of Magnetron Sputtered Ba1−xSrxTiO3 Thin Films (Phys. Status Solidi B 10/2019)

The back‐cover image shows the Ti/(Ba+Sr) ratio of tunable dielectric (Ba,Sr)TiO3 thin films prepared by radio‐frequency magnetron sputtering from nominally stoichiometric targets. Independent of the Ba/Sr ratio, the Ti content at the thinfilm surfaces, which is determined using in‐situ X‐ray photoe...

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Veröffentlicht in:physica status solidi (b) 2019-10, Vol.256 (10), p.n/a
Hauptverfasser: Rachut, Karsten, Bayer, Thorsten J. M., Wolff, Jan O., Kmet, Brigita, Benčan, Andreja, Klein, Andreas
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container_title physica status solidi (b)
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creator Rachut, Karsten
Bayer, Thorsten J. M.
Wolff, Jan O.
Kmet, Brigita
Benčan, Andreja
Klein, Andreas
description The back‐cover image shows the Ti/(Ba+Sr) ratio of tunable dielectric (Ba,Sr)TiO3 thin films prepared by radio‐frequency magnetron sputtering from nominally stoichiometric targets. Independent of the Ba/Sr ratio, the Ti content at the thinfilm surfaces, which is determined using in‐situ X‐ray photoelectron spectroscopy (XPS) measurements, varies substantially with deposition conditions. The composition at the surface varies as (Ba,Sr)TiO3 ± x(Ba,Sr)O. Apart from the deposition rate, substrate orientation and oxygen content of the target influence the resulting film composition. For further details see article no. 1900148 by Andreas Klein and co‐workers.
doi_str_mv 10.1002/pssb.201970039
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