Off‐Stoichiometry of Magnetron Sputtered Ba1−xSrxTiO3 Thin Films (Phys. Status Solidi B 10/2019)
The back‐cover image shows the Ti/(Ba+Sr) ratio of tunable dielectric (Ba,Sr)TiO3 thin films prepared by radio‐frequency magnetron sputtering from nominally stoichiometric targets. Independent of the Ba/Sr ratio, the Ti content at the thinfilm surfaces, which is determined using in‐situ X‐ray photoe...
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| Veröffentlicht in: | physica status solidi (b) 2019-10, Vol.256 (10), p.n/a |
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| Hauptverfasser: | , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Online-Zugang: | Volltext |
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| Zusammenfassung: | The back‐cover image shows the Ti/(Ba+Sr) ratio of tunable dielectric (Ba,Sr)TiO3 thin films prepared by radio‐frequency magnetron sputtering from nominally stoichiometric targets. Independent of the Ba/Sr ratio, the Ti content at the thinfilm surfaces, which is determined using in‐situ X‐ray photoelectron spectroscopy (XPS) measurements, varies substantially with deposition conditions. The composition at the surface varies as (Ba,Sr)TiO3 ± x(Ba,Sr)O. Apart from the deposition rate, substrate orientation and oxygen content of the target influence the resulting film composition. For further details see article no. 1900148 by Andreas Klein and co‐workers. |
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| ISSN: | 0370-1972 1521-3951 |
| DOI: | 10.1002/pssb.201970039 |