Theoretical investigation on the influence of H 2 ${{\rm{H}}}_{2}$ additions on the He + 1% O 2 ${{\rm{O}}}_{2}$ plasma reactivity for water treatment applications

Plasma‐based technologies offer environmentally friendly means of effective water purification. Here, we present a discharge system with He + 1% O 2 ${{\rm{O}}}_{2}$. Tunable amounts of H 2 ${{\rm{H}}}_{2}$ were introduced to control the yield of reactive species. Detailed exploration of the system provides a deeper understanding of some of the fundamental chemical kinetics related to plasma‐based wastewater treatment. A global model was used to investigate the effect of H 2 ${{\rm{H}}}_{2}$ additions on the yield of some important reactive species for advanced oxidation treatment of wastewater. Humidity leakage was considered to simulate the effect of humidified environments. The pathway analysis module provides deeper insight into chemical kinetics. It was concluded that H 2 ${{\rm{H}}}_{2}$ additives can be used in tailoring plasma yield for water treatment applications. A discharge system with He + 1% O 2 ${{\rm{O}}}_{2}$ as a working gas has been presented from a theoretical point of view. Tunable amounts of H 2 ${{\rm{H}}}_{2}$ gas were introduced to control and augment the yield of reactive species. Exploration of the system, using a global model and pathway analysis module, affords a deeper understanding of some of the fundamental chemical kinetics related to plasma‐based wastewater treatment and illustrates that H 2 ${{\rm{H}}}_{2}$ additives can be used in tailoring plasma yield.