Ar/HMDSO/O2 Fed Atmospheric Pressure DBDs: Thin Film Deposition and GC-MS Investigation of By-Products

The thin film deposition in DBDs fed with Ar/HMDSO/O2 mixtures was studied by comparing the FT‐IR spectra of the deposits with the GC‐MS analyses of the exhaust gas. Under the experimental conditions investigated, oxygen addition does not enhance the activation of the monomer while it highly influences the chemical composition and structure of the deposited coating as well as the quali‐quantitative distribution of by‐products in the exhaust. Without oxygen addition a coating with high monomer structure retention is obtained and the exhaust contains several by‐products such as silanes, silanols, and linear and cyclic siloxanes. The dimethylsiloxane unit seems to be the most important building block of oligomers. Oxygen addition to the feed is responsible for an intense reduction of the organic character of the coating as well as for a steep decrease, below the quantification limit, of the concentration of all by‐products except silanols. Some evidences induce to claim that the silanol groups contained in the deposits are formed through heterogeneous (plasma‐surface) reactions. The PECVD of organosilicon coatings in Ar/HMDSO/O2 fed atmospheric pressure DBDs is presented through a comparison between the GC‐MS investigation of the exhaust gas and the FT‐IR analyses of the deposits. Oxygen addition is responsible for a reduction of the organic character of the coatings and for a steep decrease, below the quantification limit, of all by‐products except silanols.