EFFECTS OF ANNEALING INP(110) SURFACES ON SCHOTTKY-BARRIER HEIGHTS AT PD/INP(110) INTERFACES
The InP(110) surface becomes phosphorus deficient with increasing annealing temperature up to 200-degrees-C and recovers nearly the initial stoichiometry at about 350-degrees-C. The Schottky barrier heights formed on these annealed surfaces using Pd show a good correlation with the phosphorus loss f...
Gespeichert in:
Veröffentlicht in: | Journal of applied physics 1992-01, Vol.71 (1), p.314-317 |
---|---|
Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | The InP(110) surface becomes phosphorus deficient with increasing annealing temperature up to 200-degrees-C and recovers nearly the initial stoichiometry at about 350-degrees-C. The Schottky barrier heights formed on these annealed surfaces using Pd show a good correlation with the phosphorus loss from the surface due to annealing. This band-bending study using photoemission spectroscopy suggests the following: (i) Annealing creates donor defects due to phosphorus loss form the surface with a level at about 0.6 eV above the valence-band maximum (VBM); (ii) Pd deposition on InP (110) creates some other defects at around 0.9 eV above the VBM as usual; (iii) the surface Fermi-level positions ranging from 0.62 to 0.9 eV above the VBM are determined by the balance of these interface defect-state densities. |
---|---|
ISSN: | 0021-8979 1089-7550 |
DOI: | 10.1063/1.350708 |