Horizontal GeSn/Ge multi-quantum-well ridge waveguide LEDs on silicon substrates
A horizontal p-i-n ridge waveguide emitter on a silicon (100) substrate with a Ge0.91Sn0.09/Ge multi-quantum-well (MQW) active layer was fabricated by molecular beam epitaxy. The device structure was designed to reduce light absorption of metal electrodes and improve injection efficiency. Flectrolum...
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Veröffentlicht in: | Photonics research (Washington, DC) DC), 2020-06, Vol.8 (6), p.899-903 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A horizontal p-i-n ridge waveguide emitter on a silicon (100) substrate with a Ge0.91Sn0.09/Ge multi-quantum-well (MQW) active layer was fabricated by molecular beam epitaxy. The device structure was designed to reduce light absorption of metal electrodes and improve injection efficiency. Flectroluminescence (EL) at a wavelength of 2160 nm was observed at room temperature. Theoretical calculations indicate that the emission peak corresponds well to the direct bandgap transition (n(1 Gamma )- n(1)(HH)). The light output power was about 2.0 mu W with an injection current density of 200 kA/cm(2). These results show that the horizontal GeSn/Ge MQW ridge waveguide emitters have great prospects for group-IV light sources. (C) 2020 Chinese Laser Press |
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ISSN: | 2327-9125 2327-9125 |
DOI: | 10.1364/PRJ.386996 |