Horizontal GeSn/Ge multi-quantum-well ridge waveguide LEDs on silicon substrates

A horizontal p-i-n ridge waveguide emitter on a silicon (100) substrate with a Ge0.91Sn0.09/Ge multi-quantum-well (MQW) active layer was fabricated by molecular beam epitaxy. The device structure was designed to reduce light absorption of metal electrodes and improve injection efficiency. Flectrolum...

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Veröffentlicht in:Photonics research (Washington, DC) DC), 2020-06, Vol.8 (6), p.899-903
Hauptverfasser: Peng, Linzhi, Li, Xiuli, Liu, Zhi, Liu, Xiangquan, Zheng, Jun, Xu, Chunlai, Zuo, Yuhua, Cheng, Buwen
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Sprache:eng
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Zusammenfassung:A horizontal p-i-n ridge waveguide emitter on a silicon (100) substrate with a Ge0.91Sn0.09/Ge multi-quantum-well (MQW) active layer was fabricated by molecular beam epitaxy. The device structure was designed to reduce light absorption of metal electrodes and improve injection efficiency. Flectroluminescence (EL) at a wavelength of 2160 nm was observed at room temperature. Theoretical calculations indicate that the emission peak corresponds well to the direct bandgap transition (n(1 Gamma )- n(1)(HH)). The light output power was about 2.0 mu W with an injection current density of 200 kA/cm(2). These results show that the horizontal GeSn/Ge MQW ridge waveguide emitters have great prospects for group-IV light sources. (C) 2020 Chinese Laser Press
ISSN:2327-9125
2327-9125
DOI:10.1364/PRJ.386996