Slurry and processing technique of CLBO crystal

TG1; CsLiB6O10(CLBO) is a new-type nonlinear optical crystal material. CLBO has many good performances,especially the frequency multiplication performance in deep ultraviolet band. CLBO has important application prospect on solid-state UV laser,broad band tunable laser and laser nucleus flame igniter. Though,CLBO will be air slaking and cracking when the ambient humidity is more than 40%,which brings more difficult on CLBO surface finishing. According to the performance and structure characteristic of CLBO crystal,a new water-free slurry applying for CLBO crystal chemical mechanical polishing(CMP) was investigated. The abrasive is SiO2. The influence of polishing processing parameter on polishing process for CLBO crystal was discussed,and the parameter optimal value of polishing plate speed,pressure,pH value and abrasive concentration were determined. Through such parameters,high efficiency and precision plane polishing was gotten. The CLBO CMP process was studied,the results show that low pressure and high speed can improve the CLBO crystal surface removal rate and flatness.