Developing high-quality g-C3N4 film electrode for the photoelectrocatalytic degradation of methylene blue in water

Developing a high-quality photoelectrode for photoelectrochemical applications is still an ongoing chal-lenge.In this study,we prepared the g-C3N4 film on the indium tin oxide(ITO)glass through conven-tional coating,liquid-based growth,in-situ calcination,and vapor deposition methods,respectively.Th...

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Veröffentlicht in:中国化学快报(英文版) 2023, Vol.34 (3), p.175-180
Hauptverfasser: Yanxi Gong, Jianbing Wang, Zikun Cheng, Zhiyuan Han, Xu Zhao, Buyu Chai, Yuanchun Han
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Sprache:eng
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Zusammenfassung:Developing a high-quality photoelectrode for photoelectrochemical applications is still an ongoing chal-lenge.In this study,we prepared the g-C3N4 film on the indium tin oxide(ITO)glass through conven-tional coating,liquid-based growth,in-situ calcination,and vapor deposition methods,respectively.These electrodes were characterized and used as photoanodes to degrade methylene blue(MB)in water.Among these methods,the in-situ calcination method was most appropriate for preparing the continuous and or-ganized g-C3N4 film electrodes with uniform g-C3N4 coverage and strong adhesion to the ITO substrate.It also had the highest activity in the photocatalytic(PC),electrochemical(EC),and photoelectrocatalytic(PEC)degradation processes of MB.In the PEC reaction,at an applied potential of 1.0 V and a light inten-sity of 0.96 W/cm2,the removal rate of MB was 62.5%,which was much higher than those in the PC and EC reactions.The high degradation rate was due to the synergistic effect of PEC degradation,wherein the PC and EC reactions promote and optimize each other.In the PC reaction,MB was degraded by-CH3 elimination,while the EC degradation pathway mainly included the conversion of sulfhydryl into sulfox-ide and the opening of the central aromatic ring.Both methyl loss and aromatic ring opening occurred in the PEC reaction.Moreover,some monocyclic compounds were formed,and MB showed more complete degradation in the PEC reaction.
ISSN:1001-8417