Electrodeposition of SnO2 nanocrystalline thin film using butyl-rhodamine B as a structure-directing agent

Porous SnO2 nanocrystalline thin films were successfully electrodeposited from an oxygen-saturated acid aqueous solution of SnCl2 containing different concentrations of butyl-rhodamine B(BRhB) at 70℃.BRhB with substitute of amidocyanogen can be dissolved in the acid deposition solution,where HCl was...

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Veröffentlicht in:Chinese chemical letters 2010-12, Vol.21 (12), p.1505-1508
Hauptverfasser: Yang, Jing, Bai, Shou Li, Luo, Rui Xian, Chen, Ai Fan, Lin, Yuan, Zhang, Jing Bo
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Sprache:eng
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Zusammenfassung:Porous SnO2 nanocrystalline thin films were successfully electrodeposited from an oxygen-saturated acid aqueous solution of SnCl2 containing different concentrations of butyl-rhodamine B(BRhB) at 70℃.BRhB with substitute of amidocyanogen can be dissolved in the acid deposition solution,where HCl was added to suppress hydrolysis of SnCl2.So it was used as a structure-directing agent to promote the crystal growth of SnO_2.The formed porous morphology and tetragonal rutile crystalline structure of the electrodeposited thin films were controlled by the addition of BRhB with different amounts.
ISSN:1001-8417
1878-5964
DOI:10.1016/j.cclet.2010.07.004