D301 resin as a solid base for phosphine-free Heck reactions with heteroaryl halides

A new and practical method of the D301 resin, a weak basic anion exchange resin with secondary amine functionality (Grade Matrix Structure: Styrene-DVB D301R), used as base to Heck reactions catalyzed by palladium reagent without phosphine compound as ligand is described. It was found that the D301 resin used as base is an efficient and reusable base and can be regenerated and recycled in the reaction. The olefination of heteroaryl halides prepared the corresponding products in good yields using D301 resin as base.