Improvement of interfacial electron scattering by introduced NiFe nanoparticles
Ta/MgO/NiFe/MgO/Ta ultrathin films with and without intercalation of NiFe nanoparticles in MgO layers were prepared by magnetron sputtering, followed by a vacuum annealing process. The measured and calculated results show that the former has higher specular electron scattering (SES) parameter at MgO...
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Veröffentlicht in: | Rare metals 2012-04, Vol.31 (2), p.117-120 |
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Hauptverfasser: | , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Ta/MgO/NiFe/MgO/Ta ultrathin films with and without intercalation of NiFe nanoparticles in MgO layers were prepared by magnetron sputtering, followed by a vacuum annealing process. The measured and calculated results show that the former has higher specular electron scattering (SES) parameter at MgO/NiFe interfaces, lower resistivity, and higher magnetoresistance (MR). The improved transport properties (TPs) are mainly attributed to the suppressed diffuse electron scattering by means of the introduction of NiFe nanoparticles. |
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ISSN: | 1001-0521 1867-7185 |
DOI: | 10.1007/s12598-012-0474-y |