Thermal stability and sputtering resistance under irradiation of yttria dispersed ferrum films

Oxide dispersion strengthened （ODS） steels are considered as potential candidates for high temperature applications in fusion reactors be-cause of their excellent thermal creep behavior. In the present work, the double-target magnetron co-sputtering method was recommended to prepare yttria dispersed ferrum films. Vacuum annealing and ion irradiation were carried out to study the surface topography and structural features of the prepared yttria dispersed ferrum samples. Experiments proved that while the yttria doping ratio in the ferrum film increases, the recrystallization temperature of the film will be enhanced and the sputtering damage by Xenon ion irradiation will be lowered. The sput-tering resistance of the obtained films would be improved with the growing of grains under vacuum annealing.