Design, Fabrication, and Modeling of CMOS-Compatible Double Photodiode
A double photodiode (PD) constructed by p?/Nwell junction and N-well/p-sub junction was designed and fabricated in a UMC 0.18-lm CMOS process. Based on the device structure and mechanism of double PD, a novel small-signal equivalent circuit model considering the carrier transit effect and the parasi...
Gespeichert in:
Veröffentlicht in: | Transactions of Tianjin University 2017-03, Vol.23 (2), p.163-167 |
---|---|
Hauptverfasser: | , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Zusammenfassung: | A double photodiode (PD) constructed by p?/Nwell junction and N-well/p-sub junction was designed and fabricated in a UMC 0.18-lm CMOS process. Based on the device structure and mechanism of double PD, a novel small-signal equivalent circuit model considering the carrier transit effect and the parasitic RC time constant was presented. By this model with complete electronic components,the double PD can be incorporated in a commercial circuit simulator. The component values were extracted by fitting the measured S-parameters using simulated annealing algorithm, and a good agreement between the measurement and the simulation results was achieved. |
---|---|
ISSN: | 1006-4982 1995-8196 |
DOI: | 10.1007/s12209-017-0038-1 |