Design, Fabrication, and Modeling of CMOS-Compatible Double Photodiode

A double photodiode (PD) constructed by p?/Nwell junction and N-well/p-sub junction was designed and fabricated in a UMC 0.18-lm CMOS process. Based on the device structure and mechanism of double PD, a novel small-signal equivalent circuit model considering the carrier transit effect and the parasi...

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Veröffentlicht in:Transactions of Tianjin University 2017-03, Vol.23 (2), p.163-167
Hauptverfasser: Xie, Sheng, Luo, Xuetao, Mao, Luhong, Li, Haiou
Format: Artikel
Sprache:eng
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Zusammenfassung:A double photodiode (PD) constructed by p?/Nwell junction and N-well/p-sub junction was designed and fabricated in a UMC 0.18-lm CMOS process. Based on the device structure and mechanism of double PD, a novel small-signal equivalent circuit model considering the carrier transit effect and the parasitic RC time constant was presented. By this model with complete electronic components,the double PD can be incorporated in a commercial circuit simulator. The component values were extracted by fitting the measured S-parameters using simulated annealing algorithm, and a good agreement between the measurement and the simulation results was achieved.
ISSN:1006-4982
1995-8196
DOI:10.1007/s12209-017-0038-1