Influence of N2 flow rate on structure and properties of TiBCN films prepared by multi-cathodic arc ion plating and studied with ion beam scattering spectroscopy

TiBCN films were deposited on Si(100) and cemented carbide substrates by using multi-cathodic arc ion plating in C2H2 and N2 atmosphere. Their structure and mechanical properties were studied systematically under different N2 flow rates. The results showed that the TiBCN films were adhered well to the substrates. Rutherford backscattering spectroscopy was employed to determine the relative concentration of Ti, B, C and N in the films.The chemical bonding states of the films were explored by X-ray photoelectron spectroscopy, revealing the presence of bonds of TiN, Ti(C,N), BN, pure B, sp2 C-C and sp3 C-C, which changed with the N2 flow rate. TiBCN films contain nanocrystals of TiN/TiCN and TiB2/Ti(B,C) embedded in an amorphous matrix consisting of amorphous BN and carbon at N2 flow rate of up to 250 sccm.