Transport and electroluminescence mechanism in Au/(Si/SiO2)/P-Si film

O484; The samples of Au/(Si/SiO2)/p-Si structure were fabricated by using the R.F magnetron sputtering technique.Its carrier transport and electroluminescence mechanism were studied from the I-V curves and EL spectra by using the Configuration Coordinate as a theoretical model.The result indicates t...

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Veröffentlicht in:Optoelectronics letters 2006-01, Vol.2 (1), p.48-50
Hauptverfasser: Zhang, Kai-biao, Ma, Shu-yi, Ma, Zi-jun, Chen, Hai-xia
Format: Artikel
Sprache:eng
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Zusammenfassung:O484; The samples of Au/(Si/SiO2)/p-Si structure were fabricated by using the R.F magnetron sputtering technique.Its carrier transport and electroluminescence mechanism were studied from the I-V curves and EL spectra by using the Configuration Coordinate as a theoretical model.The result indicates that there are two defect centers in SiO2 films.The electron in Au and the hole in p-Si went into SiO2 film by the Fowler-Nordheim tunneling model at a high bias voltage and recombined through these defect centers in SiO2 film.
ISSN:1673-1905
1993-5013
DOI:10.1007/BF03033592