用于合成新型1,3,5-三芳基吡唑啉衍生物的磷钨酸铯盐的纳米塑形、模板合成及结构研究
O643; The elimination of the silica matrix of composites by HF occurred by a two-step reaction deposition of a Cs2.5H0.5PW12O40 (CsHPW) salt nanocrystal.We used 2D hexagonal SBA-15 silica as a template for the nanofabrication of CsHPW nanoparticles.Nanocast CsHPW materials are stable against leachin...
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Veröffentlicht in: | 催化学报 2012, Vol.33 (2), p.237-246 |
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Format: | Artikel |
Sprache: | chi |
Online-Zugang: | Volltext |
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Zusammenfassung: | O643; The elimination of the silica matrix of composites by HF occurred by a two-step reaction deposition of a Cs2.5H0.5PW12O40 (CsHPW) salt nanocrystal.We used 2D hexagonal SBA-15 silica as a template for the nanofabrication of CsHPW nanoparticles.Nanocast CsHPW materials are stable against leaching and colloidization in polar solvents.The catalytic performance of the nanocast CsHPW materials exceeded that of bulk Cs2.5H0.5PW12O40,which is the most active among the acidic HPW salts.A series of novel 1,3,5-triaryl-pyrazoline derivatives were synthesized by the reaction between chalcone and phenylhydrazine in high yield in the presence of CsHPW salt nanocrys. |
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ISSN: | 0253-9837 |
DOI: | 10.1016/S1872-2067(11)60330-6 |