Internal Defect Measurement of Scattering Media by Optical Coherence Microscopy
Optical coherence microscopy is applied to measure scattering media's internal defect, which based on low coherence interferometry and confocal microscopy. Optical coherence microscopy is more effective in the rejection of out of focus and multiple scattered photons originating further away of...
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Veröffentlicht in: | Semiconductor photonics and technology 2005, Vol.11 (2), p.142-144 |
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Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | Optical coherence microscopy is applied to measure scattering media's internal defect, which based on low coherence interferometry and confocal microscopy. Optical coherence microscopy is more effective in the rejection of out of focus and multiple scattered photons originating further away of the focal plane. With the three-dimension scanning, the internal defect is detected by measuring the thickness of different points on the sample. The axial resolution is 6μm and lateral resolution is 1.2μm. This method is possessed of the advantages over the other measurement method of scattering media, such as non-destruction and high-resolution. |
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ISSN: | 1007-0206 |