Substrate processing apparatus and method

A substrate processing apparatus, comprising a substrate support provided with a support surface for supporting a substrate or a substrate carrier thereon and a support heater constructed and arranged to heat the support surface. The apparatus comprises a heat shield constructed and arranged to cove...

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1. Verfasser: ASM IP Holding B.V
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A substrate processing apparatus, comprising a substrate support provided with a support surface for supporting a substrate or a substrate carrier thereon and a support heater constructed and arranged to heat the support surface. The apparatus comprises a heat shield constructed and arranged to cover and shield the substrate support when no substrate or substrate carrier is on the support surface.