Semiconductor device having a nonvolatile memory cell with a cap insulating film formed over a selection gate electrode

To provide a technique capable of improving reliability of a semiconductor device having a nonvolatile memory cell by suppressing the reduction of the drive force.A memory cell is configured by a selection pMIS having a selection gate electrode including a conductive film exhibiting a p-type conductivity and a memory pMIS having a memory gate electrode including a conductive film exhibiting a p-type conductivity, and at the time of write, hot electrons are injected into a charge storage layer from the side of a semiconductor substrate and at the time of erase, hot holes are injected into the charge storage layer from the memory gate electrode.