Apparatus and method for producing an annular far-field patterned beam(s)

A phased array of Gaussian beams was used to form an annular far-field pattern as opposed to the normal peaked pattern in most phased arrays. This annular pattern arises from the radial symmetry of the polarization in each beam. Beams opposite one another in the annulus are polarized in the same dir...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Kurti, Ralph Steven, Wardlaw, Michael Johnny, Shori, Ramesh Kumar
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A phased array of Gaussian beams was used to form an annular far-field pattern as opposed to the normal peaked pattern in most phased arrays. This annular pattern arises from the radial symmetry of the polarization in each beam. Beams opposite one another in the annulus are polarized in the same direction but are 180° out of phase. This causes the center portion of the beam to be a null rather than a peak.