Lithographic apparatus, method and device manufacturing method

In an embodiment, a lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radia...

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Bibliographische Detailangaben
Hauptverfasser:	Hempenius, Peter Paul, Geerke, Johan Hendrik, De Vos, Youssef Karel Maria, Roozen, Nicolaas Bernardus, Van Den Boogaert, Erwin Antonius Henricus Fransiscus, Geerlings, Alexander Cornelis
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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Beschreibung
Zusammenfassung:	In an embodiment, a lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a passive noise damper configured to dampen gas borne noise caused by movement of a movable part of the lithographic apparatus.