Vapor phase deposition apparatus, method for depositing thin film and method for manufacturing semiconductor device

A vapor phase deposition apparatus for forming a thin film comprising a chamber , a piping unit for supplying a source material of the thin film into the chamber in a gaseous condition, a vaporizer for vaporizing the source material in a source material container and supplying the vaporized gas in the piping unit and a temperature control unit , is presented. The temperature control unit comprises: a first temperature control unit , which is composed of a heater controller unit and a tape heater and is capable of controlling the temperature of the first piping in the piping unit that is directly connected to the chamber ; a second temperature control unit , which is composed of a heater controller unit and a tape heater and is capable of controlling the temperature of the second piping that is connected to the vaporizer; and a third temperature control unit , which is composed of a heater controller unit and a thermostatic chamber and is capable of controlling the temperature of the valve