Customizing metal pattern density in die-stacking applications

Method, apparatus, and computer readable medium for designing an integrated circuit (IC) are described. In some examples, layout data describing conductive layers of the integrated circuit is obtained. The layout data is analyzed to identify through die via (TDV) areas. A metal fill pattern is created for each of the TDV areas having a maximum metal density within design rules for the integrated circuit. The metal fill pattern for each of the TDV areas is merged with the layout data.