Devices and methods for reducing residual reticle chucking forces

Devices and methods are disclosed for holding an object, particularly a planar object. An exemplary device has a chuck and pressure-changing device. The chuck has an object-mounting surface and a deformable membrane coupled to the object-mounting surface such that conformational changes in the membrane produce corresponding changes in the object-mounting surface. The chuck has a first cavity separated by the membrane from the chuck cavity. The pressure-changing device is coupled to the first cavity to change pressure in the first cavity, relative to outside it, sufficiently to produce a conformational change of the membrane and a corresponding change in the object-mounting surface sufficient to reduce the force with which the object is being held to the object-mounting surface. The pressure change can be a pressure increase or decrease. The change in the object-mounting surface can be, for example, a reduction in area of contact of the object-mounting surface with the object, thereby reducing the holding force.