System and method for start flow approach control for a proportional valve in a plasma cutter
A system and method for start flow approach control for a proportional valve in a plasma cutter is provided that includes a controller configured to determine a target gas pressure set point for a plasma cutting operation and determine a ramp pressure set point offset from the target gas pressure se...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A system and method for start flow approach control for a proportional valve in a plasma cutter is provided that includes a controller configured to determine a target gas pressure set point for a plasma cutting operation and determine a ramp pressure set point offset from the target gas pressure set point. The controller is also configured to apply a full-open drive signal to an air pressure-closing proportional valve and monitor a pressure of gas flow output from the air pressure-closing proportional valve via a sensing device. The controller is further configured to apply a ramping drive signal to the air pressure-closing proportional valve after the pressure of the gas flow has reached the ramp pressure set point and apply a target-pressure drive signal to the air pressure-closing proportional valve after the pressure of the gas flow has reached the target gas pressure set point. |
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