Lithographic apparatus and calibration method

Lithographic apparatus and calibration method

In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal...

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Bibliographische Detailangaben
Hauptverfasser: Van Den Brink, Marinus Aart, Butler, Hans, Eussen, Emiel Jozef Melanie, Van Der Pasch, Engelbertus Antonius Fransiscus, Van Der Wijst, Marc Wilhelmus Maria, Angelis, Georgo, Klaver, Renatus Gerardus, Hamers, Martijn Robert, Verhaar, Boudewijn Theodorus, Hoekstra, Peter
Format: Patent
Sprache:eng
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Zusammenfassung:In an embodiment, a stage system calibration method includes moving the stage relative to an encoder grid in response to a setpoint signal and measuring a position of the stage by a sensor head cooperating with the encoder grid. The position of the stage is controlled by a stage controller. A signal representative of a difference between the setpoint signal and the position of the stage as measured by the sensor head is registered. The stage system is calibrated from the registered signal representative of the difference.