Methods for self-aligned self-assembled patterning enhancement

Methods for producing self-aligned, self-assembled sub-ground-rule features without the need to use additional lithographic patterning. Specifically, the present disclosure allows for the creation of assist features that are localized and self-aligned to a given structure. These assist features can...

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Bibliographische Detailangaben
Hauptverfasser: Clevenger, Larry, Dalton, Timothy J, Radens, Carl J
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Methods for producing self-aligned, self-assembled sub-ground-rule features without the need to use additional lithographic patterning. Specifically, the present disclosure allows for the creation of assist features that are localized and self-aligned to a given structure. These assist features can either have the same tone or different tone to the given feature.