Calibration and verification structures for use in optical proximity correction

Calibration and verification structures for use in optical proximity correction

A method of training an Optical Proximity Correction (OPC) model comprises symmetrizing a complex design to be a test pattern having orthogonal symmetry. Symmetrizing may comprise establishing a axis of symmetry passing through the design, thereby dividing the design into two portions; deleting one...

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Bibliographische Detailangaben
Hauptverfasser: Viswanathan, Ramya, Abdo, Amr Y, Haffner, Henning, Park, Oseo, Scaman, Michael E
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A method of training an Optical Proximity Correction (OPC) model comprises symmetrizing a complex design to be a test pattern having orthogonal symmetry. Symmetrizing may comprise establishing a axis of symmetry passing through the design, thereby dividing the design into two portions; deleting one of the two portions; and mirror-imaging the other of the two portions about the axis of symmetry. The design may be centered.