Lithography processes using phase change compositions

A lithography method includes the steps of: A) filling a mold having a patterned surface with a phase change composition at a temperature above the phase change temperature of the phase change composition; B) hardening the phase change composition to form a patterned feature; C) separating the mold...

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Bibliographische Detailangaben
Hauptverfasser: Chen, Wei, Harkness, Brian Robert, Sudbury-Holtschlag, Joan, Petroff, Lenin James
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A lithography method includes the steps of: A) filling a mold having a patterned surface with a phase change composition at a temperature above the phase change temperature of the phase change composition; B) hardening the phase change composition to form a patterned feature; C) separating the mold and the patterned feature; optionally D) etching the patterned feature; optionally E) cleaning the mold; and optionally F) repeating steps A) to D) reusing the mold. The PCC may include an organofunctional silicone wax.