Photosensitive-resin remover composition and method of fabricating semiconductor device using the same

Photosensitive-resin remover composition and method of fabricating semiconductor device using the same

A photosensitive-resin remover composition includes an amine compound and de-ionized water, an amount of the de-ionized water being about 45% to about 99% by weight based on a total weight of the composition.

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Hauptverfasser: Lee, Ahn-Ho, Lim, Junghun, Hong, Young Taek, Kim, Hyuntak, Park, Seonghwan, Choi, Baiksoon, Ahn, Seunghyun, Lee, Byungil
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Sprache:eng
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creator Lee, Ahn-Ho
Lim, Junghun
Hong, Young Taek
Kim, Hyuntak
Park, Seonghwan
Choi, Baiksoon
Ahn, Seunghyun
Lee, Byungil
description A photosensitive-resin remover composition includes an amine compound and de-ionized water, an amount of the de-ionized water being about 45% to about 99% by weight based on a total weight of the composition.
format Patent
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title Photosensitive-resin remover composition and method of fabricating semiconductor device using the same
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