Photosensitive-resin remover composition and method of fabricating semiconductor device using the same
A photosensitive-resin remover composition includes an amine compound and de-ionized water, an amount of the de-ionized water being about 45% to about 99% by weight based on a total weight of the composition.
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A photosensitive-resin remover composition includes an amine compound and de-ionized water, an amount of the de-ionized water being about 45% to about 99% by weight based on a total weight of the composition. |
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