Lithographic apparatus and device manufacturing method
A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts.
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| Hauptverfasser: | , , , |
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A lithographic apparatus for immersion lithography is disclosed in which a seal between different parts of the substrate table may be arranged to reduce the transmission of forces between the different parts. |
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